The Study Of Mn-doped On Copper Nitride Thin Films Deposited By Radio Frequency Magnetron Sputtering

Copper nitride film has a good property of photoelectric,such as the low temperature thermaldecomposition property,high resistivity,non-toxic,cheap raw material prices and very stablecharacteristics in the air at room temperature.This article sputtered copper nitride film by RF reactive magnetron,studied the property ofthe crystalline,optical electrical,and other properties of the films under different sputtering powerand analysis of the principle and mechanism of change,then the article also explored the optimalconditions of preparation of the copper film above the silicon nitrogen,and the relationship of theelectrical properties of thin films of copper nitride thin film structure and preparation of sputteringpower,and further explored the deeper principle which provides a direction for further study ofimproving the process of the preparation of copper nitride,and even the doping modification. Thestructural characterization of samples of the copper nitride film is represented according to theX-ray diffraction.The paper used the scanning electron mic roscope to observe and analysis thesample film and adopted a four probe the probing resistivity analyzed the results.Finally, usedUV-visible spectrophotometer measuring the reflection spectrum of the thin film in order toanalysis its optical characteristics and further studied the electrical properties.The paper also studied the copper nitride film’s structure,electrical properties,mechanicalproperty, optical properties and Magnetic properties by sputtering copper nitride film withManganese doped by RF reactive magnetron.It laid the foundation for the determination ofmanganese doping conditions by selecting the optimal structure of the copper nitridepreparation.XRD analysis shows that all these materials are composed of copper nitride crystalanti-ReO3demonstrated[111] preferred orientation.By comparing the different manganese dopedCu₃N film’s resistivity and the optical properties,it can be seen that the optical properties,microhardness and the changes of the magnetic properties of Mn-doped sample will change as thedeposition of manganese.At last,the thesis analysised the reason of changes of the magneticproperties.It still needs further study in the future to find the way to effectively improve theprocess conditions of the manganese doped copper nitride.