Sample Positioning Technology And System In Laser Interference Nanolithography

Laser interference nanolithography has been developed and used for micro and nano manufacturing of periodic and quasi-periodic surface patterns in recent years. In laser interference nanolithography, a number of parameters can be used to determine the lithography pattern and exposure area, including the incident position, incident angle, space angle, phase, polarization and light intensity of beams etc. Sample positioning plays an important role in a laser interference nanolithography system. There are two tasks of sample positioning in laser interference nanolithography:1. using the sample positioning stage which has long travel and high accuracy to accomplish movements for increasing the pattern density (interpolation) and area; 2. accomplishing the measurement and alignment for beam incident gestures by particular sample positioning techniques. The beam incident gestures include the incident position, incident angle, space angle of the beams which directly affect the lithography pattern and exposure area.This dissertation discusses the sample positioning technology and system in laser interference nanolithography. Based on the two tasks of the sample positioning in laser interference nanolithography, the following studies were done:1. design of a sample positioning stage which can meet the requirements of the laser interference nanolithography: 2. development of a new sample positioning technology based on light spot detection. Through theoretical analysis, computer simulation and a series of experiments, it is verified that the sample positioning technology has good precision and repeatability in the measurement and alignment for beam incident gestures, and it can be used in actual laser interference nanolithography.