Preparation And Characterization For Antireflective Structures Of Silicon Solar Cells

With the growing shortage of traditional fossil energy sources and the serious damage to the ecological environment, it is an urgent need for an environmentally friendly clean and renewable energy. The solar cells convert light directly into electrical energy, without pollution for environment, whose R & D is important, which can improve the ecological environment and promote the development of low-carbon economy. Therefore, in this paper, we design and prepare the antireflective structure in the surface of silicon solar cells to reduce efficiency losses , to provide a basis of the new generation of highly efficient solar cells.We carry out the study of new micro-nano structure in the silicon surface , using the metal-sesisted chemical etching method to design and preparenanostructure. On the basis of understanding fully the catalytic mechanism of precious metal particles and anti-reflection mechanism of silicon surface nanostructure. Firstly , silver nano- particles are deposited on the silicon surface by ion sputtering and silver mirror reaction , and then use their catalytic properties to achieve the acid etching of silicon; we also adopted single-step whole solution method to directly implement the acid etching of silicon. As a result, we obtain different kind of nanostructures - porous structure, nano-cluster structure and the nanowire. Finally, we measure the reflectance spectra of these nanostructure.On the one hand, we investgate different deposition conditions which have effect on the morphology of silver nanoparticles and its distribution, master the controlled deposition process of silver nanoparticles on the silicon surface; the other hand, using the catalyst of nanosilver particles , we obtain the effect of these parameters on the surface morphology by changing the morphology of silver nanoparticles, the composition of acid etching solution and etching time,et al, parameters to realize the etching of silicon substrate; Finally, from the precious metals assisted etching mechanism to proceed, we analysis deeply the nanostructure formation mechanism.The nanostructure of the paper can reduce the reflection loss of incident light to 2% in the range of 300～1000 nm. At the same time, the nanostructure not only can effectively reduce the composite of the surface carrier, also it will not affect the subsequent production of solar cells. In the metal-assisted chemical etching process, our innovativly use the silver mirror reaction to achieve different forms of silver nanoparticles on the silicon surface, then obtained different silicon nanostructures by acid etching. The single-step full-solution method, due to low cost, easy to operate and the better anti-reflection effect (less than 4%) than the traditional alkaline etching (11%), very promising to replace the current industrial alkaline etching method.