Self-Assembly Of Diblock Copolymer And Synthesis Of Multi-Functionalized Poss

In this paper, we synthesize two kinds of POSS-based polymer, the tadpoled-shaped POSS-PBA and star-shaped POSS-PS by using atom transfer radical polymerization (ATRP). Meanwhile, we choose the symmetric, low-dispersion PS-b-PMMA as a self-assembled template. The different post-processing ways and the introduction of nano particalscare considered to influence the PS-b-PMMA microphase separation. The main contents are listed as below.1. Two kinds of POSS-based organic-inorganic hybrid nano particals were synthesized by using atom transfer radical polymerization (ATRP), the narrow PDI tadpole-shaped POSS-PBA and the wider PDI star-shaped POSS-PS.2. By means of the spin-coating on the silicon substrate, the self-assembly of symmetric PS-b-PMMA diblock copolymer was observed in different post-processing way. According to TEM and AFM testing, lamellae structure, mesh structure, sea-island structure and other a wide range of micro-phase separation structures were formed on the condition of toluene, THF, chloroform, cyclohexane, acetone and thermal treatment. The regular lamelle structure was formed by manipulating with TCE atmosphere for 2h simultaneously, the size of PS and PMMA phase is 50nm and 20nm, separately.3. By the introduction of 2% star-shaped POSS-PS nanopartical in the PS-b-PMMA self-assembling system, sea-island structure, lamelle structure, interpenetrating mesh structure and random-continuous phase structure were observed on the condition of bulk, chloroform, acetone and benzene, ordinally. According to the studying on the different post-processing time in the TCE atmosphere, a small number of particles have little effect on the PS-b-PMMA self-assembling system. The size of PS and PMMA phase is 50nm and 25nm in 2h～4h, separately. However, the size of PS and PMMA phase is 50nm and 40nm in 4h～8h, separately.4. Introducing 12.5% tadpole-shaped POSS-PBA nanoparticals into the PS-b-PMMA self-assembling system, the regular lamelle structure was obtained in TCE for 4h, which size of PS and PMMA phase is 35nm and 47nm, respectively. Meanwhile, the regular structure of PS-b-PMMA/POSS-PBA (2%)/C60-PS (2%) system was formed on the condition of TCE for 6h, which size of PS and PMMA phase is 35nm and 50nm. It is showed that the large partical content affect the size and time of the stabilizing time.5. The alternative dielectric & conductive POSS-C60 hybrid film was obtained though UV etching and physical deposition method, the width of dielectric siloxane is 40nm; the thickness of conductive C60 is 10nm.