| Mask Projection Stereolithography is an important direction of development of SLA. Compared with other rapid prototyping process, it has faster forming, more simplified structure and process equipment. With the development of DMD, Mask Projection Stereolithgraphy has been widely concerned. But its technology is still in the development stage, the related products are limited. It has very important practical significance and application value to do the research of its key technology.This paper discusses the characteristics of Mask Projection Stereolithography and the mechanism of resin shrinkage, propose the appropriate measures to improve the accuracy of parts. The bottom-exposure stereolithography solve the cured resin warp problem, and have faster forming and simple, reliable processing methods. After the exposure of each layer, the platform has to be levered up, but the cured layer might not levitate together. In order to conquer the pulling failure, a silicon film is utilized to separate the curing part easily, and add tartaric acid to the epoxy resin to enhance the adhesion between resin and the platform.Exposure time is an important processing parameter in Mask Projection Stereolithography. To reduce its processing planning errors, the minimum exposure time is mathematically modeled in the graphics generation process. Through prototype testing, the model meets the requirements for setting the processing parameters to provide a reference.To improve the tensile strength of the building parts, orthogonal design method is used, the main factors of the tensile strength is grouped to test. It offers the best combination of parameters for high-strength-based system. |
