The Studying Of Focused Proton Beam Direct-writing

PBW (Proton Beam Writing) is a direct-write technique that uses a highly focused MeV protons beam to pattern structures in a suitable resist material at micro-or nano-dimensions. This technology is similar to electron beam direct writing. The mass of proton is1840times of electron, and, the MeV proton beam has deep penetration in resist materials with a straight path. Therefore the PBW technology can be used to fabricate three-dimensional, high aspect ratio structures with vertical, smooth sidewalls and low LER (line edge roughness). In different resist and substrate (such as PMMA, SU-8, HSQ, Si), The proton's projected range was calculated by SRIM program.The details can be used in PBW. The PBW instrumentation was established on the scanning proton microprobe (SPM) beamline of Shanghai Institute of Applied Physics, CAS. The studying of spin-coating resist layer and developing technology were carried out. A6μm AR-P6510.12resist layer was spin-coated at3000rpm for40s. A12μm AR-N4400-10resist layer was spin-coated at4000rpm for40s. On the positive resist layers, the Haibao outline were scanned and a double-rectangular micro-structure were fabricated. On the negative resist layers, the parallel lines and a crisscross micro-structure with were respectively fabricated. In the PBW experiment,some actions need to be taken to improve the effects.