| TiO2 is regarded as the most promising catalytic due to its nature stability, avirulent, low-cost and high photocatalyst activity. However, it high photocatalyst performance strongly depend on the irritation of the UV light while the utilization of the visible light is limited, which severely limit its application. In order to make full use of the solar rays, the titanium dioxide must be modified.In this paper, Fe, Cu, Al-doped titanium dioxide (TiO2) thin films were prepared by electron beam evaporation method. The influence of substrate material, doping ions,dopping concentration and annealing temperature, etc. on the component, structure and the activities of the as-prepared TiO2 films were investigated. Atomic Force Microscope(AFM), Scanning Electron Microscopy(SEM),Raman Spectroscopy, X-ray Diffraction(XRD) and X-ray Photoelectrons Spectroscopy (XPS) were employed to characterize the surface morphology, the crystal structure and the component of the sample. In order to analysis the effect of doping different materials ions on the visible absorption range of TiO2 thin films, UV-Vis spectroscopy was used to test the absorption. Results showed that dopping of metal elements hindered phase transfer of TiO2, restrained growth of TiO2 particles and lead to red shift of the absorption limit of dopping TiO2 thin films, and expansion of absorbed wavelengths scope.The B-doped TiO2 films were prepared by electron beam evaporation for further research. The impact of different substrates (such as quartz, glass, ceramic) and annealing temperature on the component, structure and the morphology of the as-prepared TiO2 films. The results showed that the film prepared on the quartz exhibits best performance and the absorbtion wavelength range can also be expanded by dopping B.In the end, the photocatalyst property of the as-prepared TiO2 thin films are tested under different light source, different initial methyl orange concentration, and the preparation technical conditions on the photocatalyst property were analyzed. |