Annular Polishing Technology Research

With the development of large optical system, there is a tremendous demand for large ultra-precision optical components, so how to meet the demand is really a challenge to the optical manufacturing industry. Continuous Polishing (CP) is a major polishing technique for plane optical components, it play very important a role in fabricating high-precision plane optical elements. But so far it hasn't been used extensively in mass production because of too much dependence on the optician's skill, low efficiency and unstable quality, which is caused by the incompletely clear about the essence and laws of polishing, the material removal mechanism and process parameters.In the thesis, CP technology is studied in terms of theory and experiment. First the author reviews its development and current situation briefly, then the material removal is analyzed theoretically, and new process experiment is carried out.Aiming at polishing process, starting from Preston equation the material removal model is perfected base on the analysis to the relative motion between polishing lap and workpiece. And removal law of material is studied in the light of the new model.Relative removal is introduced to describe removal homogeneity during polishing, especially the influences of speed ration, eccentric distance, pressure and the edge effect on removal are analyzed.By Finite Element Analysis, the contact pressure distribution between workpiece and lap are simulated, and the results are very useful for guiding the position adjustment of corrector and material removal control.Finally, process experiment is done completely. Core process parameters are studied in detail, its optimal values are recommended, and the test results are given.