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High-performance Aluminum Base Nitride Composite Films

Posted on:2007-01-08Degree:MasterType:Thesis
Country:ChinaCandidate:S H PengFull Text:PDF
GTID:2191360182992512Subject:Materials Processing Engineering
Abstract/Summary:
A1N films were deposited by Bulat-6 multi-arcs ion film plating machine, and then, on the basis of this technics, the AlCrN and AlCrSiN compound films were prepared by VAD and IBAD. Surface and sectional topography were observed by SEM;structure of the film was determined by XRD machine;microhardness of the films were measured by the microhardness test machine;resistance of abrasion and inoxidizable were also studied. The affection of Cr or Si content to the structure, appearance, microhardness, friction performance and high-temperature oxidation resistance of the A1N based films were analyzed in the article.Technics of preparing A1N film were feasible, and the best N2 pressure is 0.25Pa. The Cr content in (Al,Cr)N films can be controlled accurately by the proportional regulator, and its percentage composition varies with the flux of the proportional from zero to 9.2 percent. The microhardness and wear-resisting proerty were enhanced by adding Cr, and more Cr is added, better performance of the films is obtained.In the way of Al/Si alloy targets preparing (Al,Cr,Si)N films, composition demixing of Si was observed, Si content in films was more lower than its in targets. Si exist in films by the solid solution or its nitride, so it does, the character of (Al,Cr,Si)N films was improved. What's more, the application of ion beam assistance technology can improve the (Al,Cr,Si)N film's characters, such as thinning crystalline grain, increasing the wear-resisting property and high-temperature oxidation resistance.When the (Al,Cr)N series films was put in hot environment, the suface of films was oxidated rapidly, primary products of oxidation were Al2O3 and Cr2O3, such barrier layer can insulate the oxygen atoms and the base materials effectively, so the substrate can be protected. With the adding of Si element, the structure of (Al,Cr,Si)N films was improve, so that the high-temperature oxidation resistance was also improved.
Keywords/Search Tags:(Al,Cr)N films, (Al,Cr,Si)N films, multi-arcs ion plating, high-temperature oxidation resistance, Ion beam assistance deposition
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