| At first the development of transparent conductive oxide film is summarized and the advantages of aluminium doped zinc oxide (AZO) film are discussed in this paper.Then the research of AZO, such as crystal structure, doping, preparment and usage is discriped. R.F magnetron sputtering is employed to deposit AZO films on PET flake. The films show different structure, texture and optoelectric properties with the change of sputtering parameters, such as work presuure and R.F power. Many types of equipment, such as AFM, XRD, EDS, spectrometer and sheet resistance probe are used to measuere the structure and properties of zinc oxide films; finally we get several conclusions as following:1.The Ar pressure has great influence on the structure, morphology and properties of the films. When the pressure increases from 0.2Pa to 2.0Pa, some conclusions as following can be found. l)The film thickness and the decreses because the collision times increase.2)The diameter of particles and roughness of AZO film increased greately.3)EDS results show that the composition change of the film is complicate, but the atom ratio of Zn/Al reaches maximum at l.5Pa. 4)The sheet risistance and risistivity of the films increase greatly, at 0.2Pa we can get the risistivity as low as Sxl0-4Ω cm. 5)A11 the films prepared has the transparency of 90% in the visible range,the band becomes narrow and the blueshift is very clear.2. As the R.F power increase, we could find that: l)The film thickness and groth rate increase greatly.2) The particles of the film become small at first, then become bigger because of the temperature, but the roughness increase all the time.3)At the range of 125W~150W,the atom ratio of Zn/Al reaches the minium which is close to the compositon of the target.4)The sheet resistance and resitivity decrease rapidly.5)R.F power influent the shape of the transparency curve,the film made at low R.F power has wider transparency range,the wideness of the band is even bigger. |
PDF Full Text Request