| The preparation, stability and decomposition of methyl-hydrazine oxalate (MHOX) were investigated.The white needles of MHOX were obtained as the solution ofMHOX was added into the anhydrous alcohol. The molecularformula of MHOX is (CH3N2H4)2C2O4. The aqueous solution ofMHOX is stable at ambient temperature.The kinetics of redox reaction between MHOX and hydrogenperoxide was studied. By investigating the influence of variousfactors on H2C2O+4-H2O2 system, the kinetic rate equation isobtained as follows:- d[Ox]/dt = k [Ox][H2O2][ H+]0.34The rate constant of reaction k = 1.8±0.057(mol/L)-1.34h-1 at 90℃. Half decomposition time, t1/2(h), for oxalic acid in 0.5mol/LHNO, at 90℃ is:tl/2=0. 49/ [H2O2]Using H2O2 as an oxidant, the rate of decomposition of methyl-hydrazine is higher than that of oxalic acid. The decompositionreaction is as follows:H2O2 + CH3N2H3 → N2 + CH4 + 2H2OBy investigating the influence of concentration of CH3N2H3 andH2O2 on reaction, the kinetic rate equation in the experimentalconditions is presented as follows:'; d[CH,N,H,l/dt = k [CH,N,H,][H,O,]The rate constant of reaction k=0.67 t 0.038(mol/L)-'h-' at 29'C. The rate of reaction of MHOX with H2O, depends on that ofoxalic acid.The washing efficiency of 3 0%TBP-OK containing micro-quantity of uranium was studied with MHOX. The effects ofwashing time, concentration of washing solution, phaseratio(A/O), molar ratio of [CH,N,H.+]/[C,O.'-] and irradiationdose on the wa'shing efficiency were investigated. Theexperimental results show that the washing efficiency of uraniumfrom 30%TBP-OK with MHOX is as same as that with Na,CO,.The washing efficiency of Pu from 30%TBP-OK and Pu andAm from DHDECMP(CMP) with MHOX was also studiedrespectively. Experimcnts show that the washing efficiency of Puand Am with MHOX is slightly higher than that with Na,CO,.The concentration of uranium remained in 3 0%TBP-OK isabout lmg/L after the organic phase containing more than40mg/L was washed in four-stage countercurrent cascade withMHOX.Therefore, it is potential that MHOX would be used as asalt-free washing reagent for cleaning extractant, such as TBPused in Purex Process and CMP used in CMP Process. |