Study On Synthesis, Properties And Applications Of High Purity Aluminum Compounds

With the miniaturization of intergrated circuits, the shrinking of chip size and the ascension of function become the key of semiconductor manufacturing technology. In the processing of the microchip, aluminiferous film including aluminum film, aluminum alloy and alumina film have received wide attention and application because of its excellent performance. However, there are a variety of drawbacks for conventional aluminum precursors, such as instability, being extremely sensitive to air and moisture, being flammable and explosive, which limits its application in the integrated circuit to a certain extent. Therefore, design and synthesis of new, high-purity aluminum compounds as precursor deposite excellent performance thin films applied to integrated circuit by atomic layer deposition, which is very meaningful.We synthesized and purified three traditional alane, respectively trimethylamine alane(TMAA), N, N-dimethlethylamine alane(DMEAA), dimethylaluminum hydride(DMAH). We strived to make them for the purification of metal ion impurities content dropped to ppb level through the method of experiment.According to the study on the reaction of aminopyridine derivatives with trimethylamine alane under the nitrogen atmosphere, we found the reaction can give a series of new products with distortion octahedron structure which are three ligands connected with one aluminum atom, and has six-coordinate geometry at Al atom. The structure of the products was confirmed by several characterization methods like melting point, IR, 1H NMR, 13 C NMR, 27Al NMR spectroscopy and X-Ray single crystal diffraction. Through research on the thermodynamic properties, we obtained the thermal stability and the volatile of the products and the influence of different substituent of products on volatile. The steric effect is larger and the alkyl chain of substituent is shorter, the volatile of products is better. However, the number of ligand in the products is three, resulting in the products having high volatilization temperature.In terms of the study on the reaction of aminopyridine derivatives with trimethylaluminum under the nitrogen atmosphere, we found the reaction can give a series of new products with an eight-membered(NCNAl)2 chair, which is a stable dimer with a four-coordinate geometry at Al atom. The structure of the products was confirmed by several characterization methods like melting point, 1H NMR, 13 C NMR, 27 Al NMR spectroscopy and X-Ray single crystal diffraction. Through research on the thermodynamic properties, we got that the dimers have good thermal stability and volatile and obtained the influence of different substituent of products on volatile. We believe the novel dimer [Me2Al N(2-C5H-4NSi Me3]2 is a very promising precursor for ALD deposition of thin films not only because it has a good volatility and thermal stability but also it has the characteristics that is not sensitive to air and moisture. The dimer is in a “sleeping” state at room temperature, when heated to 102 oC, it would experience depolymerization as monomer, a “waking” state for the deposition of thin films, which is highly chemically reactive activity and has a good volatility, thermal stability and higher vapor pressure at lower temperature. And the monomer would slowly become stable dimer at room temperature which incated it has good regeneration.