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<sub> Of Tio 2 </ Sub> Thin Films And Their Optical Performance

Posted on:2008-01-09Degree:MasterType:Thesis
Country:ChinaCandidate:F GaoFull Text:PDF
GTID:2190360215485700Subject:Optics
Abstract/Summary:PDF Full Text Request
TiO2 is the most potential photocatalyst because of its stablechemistry properties, non-toxic and low cost. The appearance ofnanotechnology injects new vigor to photocatalyst field. Nano-TiO2 haveobvious suface effect and quantum-size effect, as a result, it shows morepowerful oxidizing ability and reducing ability. In order to improve thephotocatalysis property and make good use of sunlight, many kinds ofnew type photocatalysis material have been developed continually.Besides TiO2 modification photocatalyst, there are oxynitride, sulfide,titanates, columbate and so on. But TiO2 is the most widely usedphotocatalyst in view of cost and stability.In this paper, TiO2 thin films were prepared by DC magnetronsputtering at different oxygen partial pressure on the substrate of glass.The effect of different oxygen partial pressure and metal ion doping onsurface morphology, chemical composition, photoabsorption performanceand photocatalysis property was studied. TiO2 thin films doped withvarious metal ions such as Cu, Ni, W, Mn and Ag, were prepared byco-sputtering. And its effect was studied also.The results show that, with the increase of oxygen partial pressure,the crystal size grows by degrees and the crystal quality is improved aswell. In absorption spectrum, the intensity of ultraviolet peak located at300 nm decreases, the absorption between 330 nm and 465 nm increasesgradually, and the absorption after 465 nm decrease.The effect of metal ion doping in TiO2 thin films shows that, it ishelpful for the formation and growth of anatase phase, surfacemorphology, photoabsorption property and photocatalysis property isimproved as well.
Keywords/Search Tags:DC magnetron sputtering, TiO2 thin films, oxygen partial pressure, metal ion doping, photocatalysis property
PDF Full Text Request
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