Modification Of ZnS/Al₂O₃Administered And The Synergy Of Low Temperature Plasma H₂S Decomposition

It is a good method to decompose H2S in non-thermal plasma aided by semiconductor catalysts. ZnS/Al2O3is a good semiconductor catalyst to decompose H2S. This paper studies focus on the improvement of the ZnS/Al2O3catalysts. The following results were obtained:A series of supported PxZnS solid solutions with different P/Zn molar ratios were prepared, and characterized by different techniques. The catalytic performances of catalysts were investigated in the plasma-induced H2S decomposition. Po.ioZnS/Al2O3and P0.15ZnS/Al2O3catalysts showed the highest activity for H2S decomposition, which can be attributed to their small sulfide cluster size and uniform distribution.A series of supported ZnO-ZnS/Al2O3solid solutions with different ZnO/ZnS molar ratios were prepared, and characterized by different techniques. The catalytic performances of catalysts were investigated in the plasma-induced H2S decomposition. Compare with ZnS/Al2O3, the conversation of H2S by ZnO-ZnS/Al2O3increased by20%. This can be attributed to that the ZnO and ZnS formed heterostructure administered and inhibited the composition of the electronic-hole which enhances the catalytic efficiency.Through the ammonia (NH3) heat treatment and hydrogen-nitrogen (H2, N2) plasma for N doping and modification of the ZnS/Al2O3catalysts, and characterized by different techniques. Results show that grain size and forbidden band width were reduced afther NH3heat treatment. Nitrogen plasma treatment makes the catalyst produced mixed crystal, control of the grain size at the same time, which improved the catalytic performance...