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Study On Preparation Of Polymer Antireflection Films By Selective Dissolution Method

Posted on:2016-08-09Degree:MasterType:Thesis
Country:ChinaCandidate:Y ZhongFull Text:PDF
GTID:2181330452966109Subject:Materials Processing Engineering
Abstract/Summary:PDF Full Text Request
Antireflection (AR) film is a kind of optical thin film which could reduce light reflection andincrease light transmittance in the working spectrum through an optical surface. It has been widelyused in communication equipments, monitors, lasers, solar cells and various kinds of opticallenses. Therefore, it is necessary to study the design and preparation techniques of AR films.Firstly, acrylonitrile-styrene copolymer (SAN) AR films were fabricated by blend solution ofSAN/PS method, but its antireflection effect was not ideal and water resistance was poor,too.Secondly, the nano-sized polymethyl methacrylate (PMMA) and PS latex with narrow sizedistributions were prepared by classical emulsion polymerization and the PMMA AR films, whoseeffect of antiflection were better than SAN AR films, were prepared by blend latex method. Theantiflection effect of the films was not only in the visible region but also in the near infraredregion. Moreover, the films have certain hydrophobicity. The deficiency of this method wascumbersome.Finally, the PMMA AR films were prepared by single latex method, which wassimpler than blend latex method. The antiflection effect of the films made by single latex methodwere not bad than those made by blend latex method. Furthermore, the films have a goodresistance of ultrasonic cleaning. We could make the PMMA AR films in different base throughthe single latex method.
Keywords/Search Tags:Antireflection films, acrylonitrile-styrene copolymer, polymethyl methacrylate, nano latex, spin-coating, light transmittance performance
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