Equipment Design And Experimental Research Of The Multilayer Prepared By Jet Electrodeposition

Jet electrodeposition, as one of electrochemical deposition, has lots of advantages such as refinedgrains, selective deposition, larger applicable density, higher deposition efficiency and so on.Nano-multilayer films can be prepared theoretically by controlling reasonable current density anddeposition time. Based on the jet electrodeposition technology, experimental equipment has beensuccessfully designed. It is used to process nano-multilayer films, the wavelength of which changesfrom a dozen to hundreds of nanometers (theoretically can reach a few nanometers), and someperformances of Cu/Co multilayer films were studied based on numbers of process tests.The main work and research are as follows:(1)The experimental equipment which is made up of the movement and control system has beendesigned to process Cu/Co multilayer films. The equipment can solve the problem of cross-contamination between two plating solutions and control the temperature of plat solution accurately.To ensure that the sedimentary thickness is uniform and controllable, the inlet flow of the platingsolution and its translational velocity should be controlled accurately and stably. By using thisequipment, the Cu/Co multilayer film has been successfully processed and its wavelength iscontrollable.(2)The flow field of the nozzle was simulated through Fluent in conditions of different distancesand inlet flow velocity. The result shows that the width of low-speed zone increases with the distancegrowth; it decreases after increasing as the flow capacity increases (The width of low-speed zone isthe narrowest when Q=194L/h). The practical situation was reflected well by the simulation, and itprovided full basis for the optimization design and the selection of test parameters.(3)The sandwich of two metals depositing alternately can be seen intuitively through SEM. Theeffect of process parameters on surface microstructure and surface roughness was obtained. Thecorrosion resistance of multilayer films was tested in the solution of3.5wt%NaCl, results showingthat the ability of corrosion resistance of the multilayer film is better than pure copper and cobalt;When the wavelength is27.2nm, the highest hardness value of Cu/Co multilayer films is591HV,which is higher than the hardness of pure copper and cobalt.