266nm Ultraviolet DPL For Microelectronics Processing

266nm ultraviolet laser is high demand for application in microelectronics processing thanks to its high photon energy, high focusing power and high imaging spatial resolution. In this paper, theoretical and experimental research has been executed to achieve efficiency continuous wave 266nm Laser output, and finally 266nm continuous wave laser was obtained. Main research contents are summarized as follows:1. The plot of end-pumped Laser output power as a function of pump power has been estimated using simplified four-level Laser rate equation.2. Based on steady-state heat conduction equation, using a more realistic process of convection heat transfer boundary conditions, numerical simulation of three-dimensional temperature distribution in the gain medium which is optically pumped and under the conditions of side water cooling has been given by using the finite difference method. And also thermal effects on laser operation was analyzed .3. We discussed the design principles for thermally-insensitive stable resonator using stable cavity theory, and obtained a excellent thermal compensation effect by inserting a lens in the resonant cavity.4. Using phase-matched condition and nonlinear coupled polarization-wave function to calculate the parameter of nonlinear optical in harmonic generation process launched by KTP or BBO. Frequency doubling efficiency and optimum length of SHG crystal as a function of fundamental wave's beam quality was studied. And we described theoretical mechanism of enhanced external ring cavity for fundamental waves, which is more realistic than previous report.5. By extra-cavity frequency doubling of a end-pumped 532nm DPL with a focus lens, 266nm continuous wave Laser was outputted, however, whose power is too low to measure.