| Magnetron sputtering technology is widely used in surface modification, lamellar decoration, optical thin-film, superconducting film and functional films in resent years. Unbalanced magnetron sputtering has 10-100 times greater ion energy than thermal evaporation.The greater energy not only can improve film performance but also make substrate huge. The traditional plane magnetron sputtering worked only in a ring-shaped field and the target utilization factor can reach to 20%-30% which lead to high costs. So many units of analysis and scholars propose their own design. Then the target utilization factor increase to some extent but the structure of the target sourse become more complex and the sputtering rate declines at the same time. But the magnetic confinement magnetron sputtering source is a new type of plane magnetron sputtering source based on theory of magnetic confinement.Magnetic confinement magnetron sputtering is desiged in simulation of magnetic fied, installation of experimental device, electromagnetic fied and gas circuit test, magnetic density test on the surface of target, working characteristics of target. So the key property of the sourse can be get. And plasma properties of magnetic confinement magnetron sputtering source at different target current and pressure are diagnosed and discussed, such as its density, electron temperature, potential using langmuir probe. And the spatial distribution of the plasma is detected and analysised.The result indicates:The sputtering area and the homogeneity is determined by the positon of electromagnetic field; The whole surface of target is sputtered when the target works and the target voltage from 300V to700V, the target current can reach to 1.2A, the top vacuum is 2 Pa; langmuir probe has steady performance and the electron density distribute on above 60% of the surface which fits to well-distributed sputtering in large area; The plasma can be extended to 150mm from the surface of target, the distance can equal unbalanced magnetron sputtering in its results. This article has an important reference value and experimental results to further study of magnetic confinement magnetron sputtering source. |
