Research On Ultra-Precision Continuous Polishing And Detection Of The Large-Size Single-Crystal Silicon Optical Reflector

With the development of optical technology, it demands higher and higher of optical surface accuracy and surface roughness. Meanwhile, with the development of large-scale optical systems, it needs more of large-size high-precision optical components. It has great significance for processing and testing of Large-size precision optical components.In this paper, it introduces principles, methods, detection, content, purpose, background and international research profile of ultra-precision optical components process. This article focuses on of theory and experiment of continuous polishing technology research, First, Analysis the polishing process of the various parameters on the surface roughness effects. Appling continuous polishing techniques on large-size flat silicon substrate processing. analysis of the polishing process of polishing disc hardness, polishing time and the temperature rise on the polishing accuracy. In combination with silicon polishing characteristics, improved technology, organize a reasonable experimental line, continuous mirror polished silicon substrate obtained a value PV of 0.403λ, surface roughness (RMS) is 0.456nm, met the requirements of ultra-precision machining.At the same time, introduced various detection methods of the ultra-precision optical components. For high-energy laser systems of high reflectivity cavity mirror reflectivity measurement, optical cavity ring-down techniques were studied. Describes the method of cavity ring-down of measuring reflectivity, discusses some of the major error factors of measurement accuracy. And designs a set of highly reflective detection device, using straight and folded cavity of theφ300mm high anti-mirror reflectivity mirror at1319nm wavelength, through the experimental error analysis, direct measurement and fold cavity can be precisely to the relative error 10^-5.