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Study Of Preparation And Texture Property By DC Magetron Sputter TiNiCu Thin Films

Posted on:2007-02-09Degree:MasterType:Thesis
Country:ChinaCandidate:T R BianFull Text:PDF
GTID:2132360182473556Subject:Materials science
Abstract/Summary:PDF Full Text Request
In this paper,it was analysised influence of sputter parameters to film quality ,optimized it an -d praparated TiNiCu film of 0,5,9 Cu content;Optimized annealing process parameters of films ;It was studied transformationtemperature and hysteresis systemly ;Studying praparation and texture structure property of films ,Aim gains the shape memory alloy film of fast respond -ing speed, it is the ideal material of parts in drive or sensor.By SEM and TEM observing and analyzing films morphology,surface quality and texture str -ucture and composition;Crystal temperture range , transformation temperture and hysteresis we -re tested by DSC; Crystal temperture range and room texture of films were confirmed by the su -ccessive heating and room temperture XRD separately.Results were founded:(1)The technology of preparing thin films is stabilize and credibility by FJL520 high vacuum magetron and lion bind compound sputting instrument;Optimized sputter parameters: the sputter system pressure 1.0×10-3Pa,Ar flow 25Sccm, substrate-to-target distance 65mm , working pressure 0.6Pa,sputter power 150W;Under conditions of Optimized sputter process parameters,assuring films composition and stabilization of deposit speed rate,its deposit speed rate is 0.75nm/s.(2) Film inverted from amorphous to crystal upon crystallize temperature;Its structure densityed; Tempeature rises once more, grain will be rough and surface corse;Optimized crystallization annealing processes :TiNi film 550℃×0.5h,TiNiCu5 and TiNiCu9 film 650℃×0.5h;(3) Room texture of films annealed:TiNi film: R,TiNi2 precipitates ,remain B2;TiNiCu5 film: B2 , B19', Ti(NiCu)2 precipitates;TiNiCu9 film: B19',Ti(NiCu)2 precipitates, remain B2;(4) R phase of film was suppressed with adding Cu;Transformation hysteresis grows narrow with Cu rising, from 40.23℃to 4.63℃to 12.74℃; Clearly ,Transformation temperature range grows narrow with Cu rising, It advantages to respond speed of the shape memory property;But transformation hysteresis grows large with Cu rising, it is bad to shape memory property;...
Keywords/Search Tags:shape memory, TiNiCu film, DC magetron sputter
PDF Full Text Request
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