Preparation And Application Of Microstructure Of Monocrystalline Silicon Surface

In the recent years, with the rapid development of solar energy technology, breakthroughs have been made in the fields of research, and the industrial production scale is gradually expanding. In order to obtain higher efficiency in the same time reduce the production cost, the researchers conducted unceasing innovations in solar technology. And the surface texturisation of solar cells is one of the key technologies of the production of high efficiency monocrystalline silicon solar cells, in favor of reducing the reflection of the sun light on monocrystalline silicon solar cells’ surface, increasing photogenic charge, improving the indicators, such as solar battery short circuit current and in a large extent to enhance the performance of the battery. The purpose of this paper is to use corrosion reagent to synthesize novel monocrystalline silicon surface micro structure, explore the best conditions of experiment, to silicon surface preparation and good micro structure, and then applied to the silicon solar cell to obtain monocrystalline silicon suede velvet, better and lower suede reflectivity.This paper for the first time use K3PO4/K2HPO4 solution to prepare silicon surface micro structure. By setting three different groups of experimental conditions, with repeatedly experiments and the continuous optimization of the experimental conditions, finally obtain the best preparation process for good monocrystalline silicon surface micro structure. After analysis the experimental data of the preparation of monocrystalline silicon surface micro structure on the system, flexible apply to prepare monocrystalline silicon textured surface, then set up five groups of experimental conditions respectively are: the different concentrations of K3PO4 solution, the corrosion of different mass fraction of K2HPO4 solution, the corrosion of different mass ratio of K3PO4/K2HPO4 solution, different corrosion time and different corrosion temperature, to study the influence of surface preparation of monocrystalline silicon cashmere and reflectivity. Morphology observation of monocrystalline silicon surface micro structure and texture by using a scanning electron microscope, the reflectance map using UV visible spectrophotometer testing suede, through contrast experiment with different conditions and analysis of the experimental data, the following results are obtained: in order to get a good single crystal silicon surface with micro structure that is "Pyramid" of uniform size at range of 1-2um, the best process reaction time is 4min50 s, the mixed solution of different mass ratio is 25:1, the reaction temperature is 85℃. While in the single crystal silicon texturing experiments, by using the mixed solution of K3PO4/K2HPO4 with mass ratio of 15:1, reaction temperature of 85℃, the corrosion time of 15 min can finally obtain high quality silicon surface with the weighted average reflectivity of 11.27%.