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Research On Preparation Of Vanadium Oxide Thin Film By Magnetron Sputtering

Posted on:2010-09-07Degree:MasterType:Thesis
Country:ChinaCandidate:J J SongFull Text:PDF
GTID:2121360302965833Subject:Materials Processing Engineering
Abstract/Summary:PDF Full Text Request
VO2 film undergoes a semiconductor to metal phase transition at approximately 68℃and the associated great changes in optical,electric and magnetic properties before and after the transition make it possible to make use of this film in smart windows,laser protection and so on. However, vanadium can form dozens of vanadium oxides with oxygen. So preparation of VO2 thin films with one method is difficult. So preparation of VO2 thin film with suitable method is very important.In this paper radio frequency reactive magnetron sputtering is used to make V2O5 and than followed by vacuum heat treatment which designed by myself to prepare VO2 thin film. The films are analyzed by X-ray diffraction, X-ray photoelectron spectroscopy, atomic force microscope, scanning electron microscopy. In this paper, impact of magnetron sputtering process parameters (oxygen partial pressure, power and work pressure) and vacuum heat treatment process parameters (heat treatment temperature and time) on preparation of film are system discussed.High purity, density, surface finish V2O5 thin film has been made by radio frequency reactive magnetron sputtering. The crystallization state of film changes at different oxygen partial pressures. Increasing power and pressure is good to crystallize and form crystalline V2O5 films. Vanadium oxide film with a high level of VO2 has been prepared by following vacuum heat treatment. Studies have shown that different vanadium oxide phases are obtained by different methods of vacuum heat treatment. VO2 (B) is obtained under absolute vacuum which has not phase transition property, while under relative vacuum, with the heat treatment temperature increasing (390680℃) vanadium oxide film translate at V2O5-V6O13- VO2(R)-V6O13-V2O5 into sequence. Heat treatment time also affects phase transformation of magnetron sputtering V2O5 thin film. The role of time is similar to temperature but smaller than it. The surface morphology of film before and after heat treatment is different. The surface morphology before heat treatment is shaped as tower as a rule and the surface finish and surface dense are high. There is no defect in the surface. The surface morphology after heat treatment is shaped as rod-shaped and spherical for the film form new vanadium-oxide nucleus and than grows up during heat treatment process.
Keywords/Search Tags:V2O5 film, VO2 film, magnetron sputtering, heat treatment
PDF Full Text Request
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