Study On Coplanar Barrier Discharge And Its Application To Fabricating Thin Films

Coplanar discharge, which may generate stable thin-layer plasma, plays important rolesin Hg-free light resource, surface treatments and plasma enhanced chemical vapor deposition(PECVD), and so on. Aiming at applying the coplanar discharge to fabricating thin film,coplanar discharge reactors were designed and investigated in this paper. The coplanardischarge reactor fabricated in this paper provides a low-cost approach foratmospheric-pressure plasma CVD with stable and uniform discharge and shows promisingapplications.With the homemade coplanar discharge reactor, the author explored the fabrication TiO₂thin film by plasma CVD. The primary results show that because of the low saturate pressureof tetraisopropyl titanate (TIPT) at room temperature, it is difficult to deposit large areauniform TiO₂ thin film using the present experiment setup. However, the as-deposited TiO₂thin films using TiCl₄ as Ti resource and the present experiment setup are highlycrystallization and show good photocatalytic activity.With the self-made coplanar discharge reactor, the author also fabricated successfullyCFx thin film at atmospheric pressure and room temperature. The CFx thin films show auniform and nano-porous structure from SEM observations. XPS results indicate that thequaternary carbon atoms are the main functional group in the surface of the film. Thehydrophilicity of the film was observed.