Preparation Of Sol-gel Glass With Photosensitivity And Radiation Polymerization And Application In Microoptics

A novel HfO2-SiO2 sol-gel glass is prepared. The sol-gel glass has the properties of photosensitivity and radiation polymerization simultane- ously. The thin films are exposed by UV and X-ray respectively. Photoinduced structural change in the thin films is monitored by Fourier transform infrared (FTIR) spectroscopy. The spectroscopy shows good properties of photosensitivity and radiation polymerization. All the expected elements(C, Si, O, Hf) are detected by X-ray Photoelectron Spectroscopy.The refractive index and optical transmission have been measured. The material has high refractive index and large optical transparent range from wavelength of 400nm to 2500nm. Thermal stability is investigated by TG— DTG In a word, the results mentioned above prove the material's good optical properties and thermal stability. It is the promising candidate to replace SiO2 as the optical material.At last, the gratings are fabricated in the thin films by UV lithography and X-ray lithography respectively. The methods are very easy and cost-effective. At the same time, microlens arrays are fabricated in a single step.