Studies On Photodegradation Of Acetic Acid By UV/H₂O₂ And UV/O₃ Processes

Advanced oxidation processes constitute a promising technology for the treatment of wastewaters containing non-easily removable organic compounds, which has the advantages of high reaction speed, complete destruction of many hazardous organic pollutants to harmless compounds, such as CO₂, water and inorganic salts. Acetic acid is the main contaminant in the furfural waste water,which counts to 1.0-2.5% . While acetic acid is one of byproducts in the photodegradation of some organic compounds. The outflow of the furfural wastewater hardly reaches the discharge standard after depositing it only by the ordinary biochemistry process presently. But, to the best of our knowledge, the study regarding photo oxidation degradation of acetic acid is very limited. Hence, it is significant to research the photo oxidation degradation of acetic acid with UV/O3 and UV/H₂O₂ methods.In this study, While the UV lamp (400W) was lamp-house and acetic acid was an object of research, the photodegradation reaction was investigated under the airflow rate with 0.8 l/min and temperature of 35±2℃by UV/H₂O₂ methods500ml of 8mmol/L acetic acid was photodegradated with UV/H₂O₂ method; all kinds of influencing factors were investigated. According to the results, The optimal H₂O₂ effect was obtained when the amount of H₂O₂ is 15mmol/L. and the initial pH of reaction solution was 3.4. At this condition, the disposal rates of acetic acid, TOC and COD in the reaction...