The Investigation Of Nano-Film Prepared By Pulse Cathode Arc Discharge

Arc ion plating is coating technology which uses vacuum arc to arc evaporation source.Pulse bias arc ion plating technology is a technology developed in the 90's. Despite the introduction of the pulse bias is bias in the form of change,but it brought the new features that DC bias does't have the technology,which may have a huge impact on thin film's quality,performance and even deposition mechanism.This article introduces the development of the mechanism of the cathodic vacuum arc and the development of arc ion plating technology and bias pulse arc ion plating technology.And study the films'characters prepared by the two triggering methods under low vacuum and the factors impacting on the quality of film.The device used for the coating film set up in our laboratory.The high-voltage pulse-current power which the device used is mainly made of high voltage direct current power,pulse forming lines(LC network),electronic switches(SCR),plasma load etc.Experiments found that it is difficult to produce high-current power arc discharge simply by the high-voltage pulse-current power.So the two simple sets of trigger circuit are designed,which add voltage to carbon electrode and the discharge shell,the DC voltage is 0～215V under the DC glow trigger,high-voltage ignition trigger is 5kv and 15kv.The plasma of high density discharges between two electrodes,which lead to carbon and nitrogen plasma arc discharge,deposit on the substrate in the final.In the process of designing discharge trigger circuit,the relationship between discharge voltage and current is available,U = U₀e^-t/Ï„, time constantÏ„= RC.The selection of filter capacitor is 450V/1000uF,the choice of 1,000Ωdischarge resistance is more appropriate by calculating.Pulse cathode arc discharge triggered by DC glow and the ignition of high pressure,prepared smooth,uniform,dense carbon nitrogen nano-thin film and large spherical particles.Scanning electron microscope,electron spectroscopy analysis show that under the triggering of the DC glow discharge particles of thin film are larger,the main ingredients of the particles are carbon.In a way of the ignition of high pressure,low-voltage discharge,long discharge distance,the obtained film is mainly made of graphite particles,and when the voltage discharge and distance are relatively modest,CN film can be obtained.Theoretical analysis shows that the number of collision in the course of particles sputtering deposition increases with the extension of the discharge distance,the impact effect on the substrate the weaker.And with the higher voltage discharge,sputtering of the larger particles become biggger. Theoretical analysis agrees with experimental results.In addition,the test of spberical particles' shape and composition has done,and find that the main ingredients are carbon.In the forming process of the film,there are many factors that affect the quality of the film,such as bias,the gas flow,pressure and magnetic filter.In order to effectively control the quality of the film,the paper analyses the effect on the formation of the film from experiment and theory.In addition,as the pre-study of the magnetic filter,Matlab software is used.Solenoid's magnetic field around plasma and charged particle are simulated by using finite element analysis method,and discover magnetic filtering effect is Significantly.In order to compare quality of thin film with the mathod of pulse cathode arc discharge and magnetron sputtering,the different thickness gold nano-thin films are prepared by using SBC-12 mini-DC sputtering instrument.Grating spectrometer analyses its transmission and absorption spectra curve of visible light,that gold films appear blue shift and linetype spreading has relations with surface particles' ellipsoid shape,smaller size and wide range of size distribution.