The Study Of Sputtering Behavior And Nanometer Effect Induced By Ar～(q+) Impact On Solid Surface

In recent years, many powerful ion source such as Electron Cyclotron Resonance Ion Source (ECR), Electron Beam Ion Source(EBIS),Electron Beam Ion Trap(EBIT) could provide the highly charged ions in principle. It made us to engage in the research on the HCIs which only had been done in the universe or the high temperature plasma produced by the laboratory.In this paper , we study of sputtering behavior and nanometer effect induced by Ar^q+ impact on the solid surface. It was reported that solid surface were bombarded by slow highly charged argon ions. It is measured the dependence of secondary particles sputtering yield on projectile incidence angle, charge state and projectile energy. Microscopic mechanism of the nanometer configuration on the solid material surface which was produced by highly charged argon ion(Ar^q+,q=1, 8, 9; E_k=20 qeV -2 qkeV) has been discussed primary.Two experiments are introduced in the article. When show highly charged argon ions impact material surface, the relevance of secondary sputtered partied yield and the incident ion kinetic energy is quite obvious in the niobium and mica. But in the aurum target secondary particle yield depends on nothing. The potential energy of the secondary partied yield in the niobium target also can be observed clearly. By analyzing the target sample surface, we can see the incident ion potential energy had strong influenced on the nanometer hillocks' height on the high directional graphite (HOPG). Golden foil was hardly gotten the nanometer etching effect by impaction of HCIs.