Preparation And The Photocatalystic Activities Of N-doped TiO₂ Thin Films

Two kinds of N-doped titanium dioxide thin films were prepared by two kinds of different methods.And the different characteristics between N-doped titanium dioxide thin films and pure titanium dioxide thin films were explored.1) Titanium dioxide thin films were prepared by RF magnetron sputtering using cermic titanium dioxide target, and then the thin films were annealed by two kinds of different ways. In order to prepare the N-doped titanium dioxide thin films, the first way was that the thin films were annealed at 400℃and 550℃respectively in the special furnace filling with the NH₃ gas. In order to prepare the pure crystal titanium dioxide thin films, the second way was that the thin films were annealed at 400℃and 550℃respectively at atmosphere. The two kinds of annealed thin films which were annealed by different ways were characterized with X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), atomic force microscopy (AFM) and ultraviolet visible light spectroscopy (UV-Vis).The results show that the N-doped titanium dioxide thin films, which were annealed in the special furnace filling with the NH₃ gas, are successfully prepared and are crystallized well. By the ultraviolet visible light spectroscopy, a red drift of the absorption edge from 380nm to 420nm is observed in N-doped titanium dioxide thin films. And at the same time, the high efficiency is found in the experimentation of the degradating phenol using N-doped titanium dioxide thin films which were annealed at 400℃in the special furnace filling with the NH₃ gas.2) The N-doped titanium dioxide thin films and pure titanium dioxide thin films were prepared by reactive magnetron sputtering using metal titanium target by different approaches. The difference between the two approaches was that the nitrogen was added when prepared the N-doped titanium dioxide thin films. And the two kinds of thin films were both annealed at 300℃,400℃and500℃respectively. The annealed films were characterized with X-ray photoelectron spectroscopy(XPS), X-ray diffraction(XRD), scanning electron microscope (SEM) and ultraviolet visible light spectroscopy (UV-Vis).The results show that the N-doped titanium dioxide thin films are successfully prepared and although there are almost no differences between N-doped titanium dioxide thin films and pure titanium dioxide thin films in crystal structure and surface appearance, a red drift of the absorption edge from 400nm to 455nm is observed in all N-doped titanium dioxide thin films. And at the same time, the highest photocatalysis efficiency is found in the experimentation of the degradating phenol using N-doped titanium dioxide thin films,which was annealed at 400℃.