Research And Fabrication On The Si-based MOEMS Acceleration Seismic Geophone

With the development of economy, Energy exploration is the more and more important for national economy, social progress, even the country itself. To solve our country energy crisis, it is urgent to prospect new oil fields or other energy. As the easily discoverable energy has been exploited, the prospecting will become more difficult, and we need to improve the technology urgently. Seismic geophone, which work first in the seismic prospecting, decide the quality of the collected seismic data.The research work of the dissertation is the main research item of the project"The theoretical and experimental research on photo-electronic integrated acceleration seismic geophone technology", supported by National Natural Science Foundation of China. A novel MOEMS acceleration seismic has been developed. Combining MEMS technology with Integrated optical technology, it is of the advantages such as potential high sensitivity, wide bandwidth, high accuracy and environmental ruggedness, and suitable for mass production. It is also possible to overcome optical alignment, long term stable and handing of fiber in package process when optical fiber sensor is minimized and go into mass production.The research work of the dissertation mainly includes two aspects as follows:1. Analysis the technology status and development requirement of present sensors, especially lightwave phase modulation sensors. Sensor principle of waveguide sensor based on light phase modulation is introduced. The phase change is analyzed. Starting with the crystal optics theory, the phase change, generated by photoelastic effect, is derived. The methods for lightwave phase demodulation are discussed.2. Analysis the design of the whole system and simulation.3. lots of theoretical and experimental researches on process of waveguide interferometer and harmonic oscillator have been done. A feasible process is made and valuable technological parameters are obtained. And Mach-Zehnder waveguide interference chip is fabricated successfully and the optical measurement is executed. Adopt separately spattering, anisotropic etching and combined lithography etc. process to fabricate the chip, get good data after testing.