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A Study On The ZrO2/SiO2 Flims Of High Laser Induced Damage Threshold Prepared By E-beam Evaporating

Posted on:2007-07-05Degree:MasterType:Thesis
Country:ChinaCandidate:J LuFull Text:PDF
GTID:2120360212458415Subject:Fluid Machinery and Engineering
Abstract/Summary:PDF Full Text Request
The laser induced damage threshold of optical films has the high meaning to the laser technology. Beta-barium borate(β-BaB2O4) was prepared as the substrate by researched and analysed because of its high laser induced damage threshold and high optical nonlinear coefficient. ZrO2 and SiO2 were chosen as the materials of films due to their high chemical durability and high laser induced damage threshold. Based on the Fresnel Formulae, the Macload software was employed to design the ZrO2/SiO2 second harmonics anti-reflection films. The films were optimized with the analysis of the standing wave.The films were prepared by e-beam evaporating technology with ion assistance technology and vacuum anneal. The prepared process was controlled by IC/5 depositing controller.By the study on AFM, XRD, XPS images and curves, the result was found that the films had the high laser induced damage threshold when annealed after deposition and had the high transmission when deposited with ion assistance technology because the films had the higher interstitial density and the smaller surface roughness as prepared with ion assistance technology and vacuum anneal.The reflectivity of the films were detected as less than 0.35% and the transmission as more than 90% on 532nm and 1064nm,respectively. The laser induced damage threshold of the films was detected by the method "1 on 1 test" which showed the films were damaged at 100% probability under the laser density of 65J/cm2 when prepared with the substrate temperature 600℃ and annealed after deposited.
Keywords/Search Tags:e-beam evaporating, ion assistance technology, vacuum anneal, 1 on 1 test, laser induced damage threshold
PDF Full Text Request
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