Numerical Study On Interaction Of Intense Pulsed Ion Beam And Double-Layer Target

Intense pulsed ion beam is becoming more and more important for material science. This technology include that the material is irradiated by short-pulsed and high-power ion beam, then the structure and component of the surface of material is changed because of prompt heating and cooling. In industry field intense pulsed ion beam has been applied for material modifying, film growth, preparation of nanosize powders.The mixture among the different kind of metal atom will happen when ion beam bombard the metal target coated by metal film, because of electron stopping power, chemical bonding at interface get enhanced, so the adhesion and stability get modified, this's called of ion beam stitching. In integrated circuit, optical element, magnetic element and protection technology fields and so on, the ion beam stitching has been pay more attention.According to the processing parameter of the TEMP type accelerator imported from Russia, numerical simulation on interaction of intense pulsed ion beam for Gaussian distribution and a double-layer aluminum target coated by a thin film of gold has been made by Monte Carlo method.The spatial and temporal evolution of deposited energy can be obtained, the states of deposited energy under the conditions of different gold thickness are discussed, and the enhanced adhesion at interfaces by IPIB is involved.