Technology Of Depositing Optical Thin Films By Ion Beam Sputtering

Ion beam sputtering (IBS) is a stable, reproducible and excellent method for producing high performance optical thin films. Optical properties, mechanical properties, microstructure and surface morphology of Nb2O5, Ta2O5, SiO2 thin films deposited by IBS under different conditions were studied, and optimized parameters of depositing condition were analyzed. The results show thin films fabricated by IBS have better performance compared with those prepared by ion assisted deposition and e-beam evaporation.Depositing characteristics of IBS were analyzed, and the results show IBS is a stable and reproducible technique. Time-rate monitoring and quartz crystal oscillator monitoring were investigated, and a new hybrid monitoring strategy was developed that combines time-rate monitoring with quartz crystal oscillator monitoring. The method of fabricating dispersion compensation mirrors including chirped mirror and chirped mirror pair were discussed. Chirped mirror that can produce an average of-50fs2 GDD in wavelength of 600-1000nm, and chirped mirror pair prepared by IBS show good performance. Results demonstrate that IBS is a promising fabricating method for optical coatings.