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Arsenic ion self-annealing in thin silicon films
Posted on:
1993-05-19
Degree:
Ph.D
Type:
Dissertation
University:
Texas A&M University
Candidate:
Cheong, Yeongki
Full Text:
PDF
GTID:
1471390014997685
Subject:
Nuclear engineering
Abstract/Summary:
he self-annealing behavior of thin silicon samples when bombarded by arsenic ions has been investigated. One...
Keywords/Search Tags:
Thin silicon
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