| The interaction of incrementally vapor deposited Al atoms with organic thin films was studied using multiple surface science techniques, primarily infrared reflectance spectroscopy and X-ray photoelectron spectroscopy. The focus of this study was for Al coverages of <10 A. A series of studies were conducted on functionalized self-assembled monolayers on gold of structures HS(CH2)15-X where X is -CH3, -OH, - OCH 3, COOCH3, COOH, NO2, and NH2. A fluoropolymer thin film was also studied. The Al was found to be unreactive with the -CH 2- and -CH3 groups, slightly reactive with -OCH3, CF2 and CF3, and highly reactive with the other oxygen and nitrogen containing functional groups. Al penetrates into the -CH 3 terminated monolayer to the substrate interface, but no penetration was observed into the other monolayer systems. The stoichiometry and structure of these Al interactions are discussed.;Next, the interaction of both K and Al with small, rigid rod, conjugated, molecular wire systems was studied. Al was observed to interact weakly with the system conjugation. One sample was doped with evaporated K prior to Al exposures in order to determine how Al reacts with a doped molecular wire species.;Finally, a multiple angle of incidence, single wavelength surface plasmon resonance instrument was constructed to study real time interactions of metal atoms at organic monolayers. The instrument was next converted into an ellipsometer by making a few simple modifications. This is the first time that a "surface plasmon ellipsometer" has been reported. |
