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Reaction paths for self-organized surface roughening of silicon-germanium alloys during hydride gas-source molecular beam epitaxy

Posted on:2002-08-03Degree:Ph.DType:Dissertation
University:University of Illinois at Urbana-ChampaignCandidate:Spila, Timothy PaulFull Text:PDF
GTID:1468390011990841Subject:Engineering
Abstract/Summary:
Compressively-strained Si0.7Ge0.3 layers were grown on Si(001) by gas-source molecular beam epitaxy (GS-MBE) from Ge 2H6/Si2H6 mixtures in order to probe the effect of surface hydrogen on the evolution of strain-induced roughening and misfit-dislocation-induced surface roughening (crosshatch).; Fully coherent layers were grown at Ts = 450–550°C, where strain-induced roughening is observed in solid-source MBE (SS-MBE). Three-dimensional strain-induced growth mounds are obtained in samples deposited at Ts = 550°C for which the steady-state hydrogen coverage &thetas; H is 0.11 ML. However, mound formation is decreased at 500°C (&thetas; H = 0.26 ML) and completely quenched at 450°C (&thetas;H = 0.52 ML). The large differences in surface morphological evolution are due primarily to effects of &thetas;H on film growth rates RSiGe and asending step-crossing probabilities. Growth at 450°C remains two-dimensional, since both RSiGe and the rate of mass transport across ascending steps are low. Raising Ts to 500°C increases RSiGe faster than the diffusivity leading to shorter mean surface diffusion lengths and the formation of extremely shallow, rounded growth mounds. The low ascending step crossing probability at 500°C results in mounds that spread laterally, rather than vertically, due to preferential attachment at mound edges. At Ts = 550°C, the ascending-step crossing probability increases due to both higher thermal activation and lower hydrogen coverages. The mounds height increases by more than a factor of ten, while their areal density remains constant. This leads to the formation of self-organized 3D {lcub}105{rcub}-faceted pyramids at 550°C similar to those observed during SS-MBE.; Si0.7Ge0.3(001) layers were grown at Ts = 450°C, where strain-induced roughening is completely quenched, to thicknesses greater than the critical value for misfit dislocation formation (tc ≃ 100 nm) to probe the effect of &thetas;H on cross-hatch formation. At t slightly larger than tc, surface roughness is dominated by single- and multiple-atomic-height steps associated with the interfacial misfits. The surface steps are preferential H desorption sites, thus the increased total step length results in a decrease in &thetas;H on terraces which increases RSiGe and allows higher adatom ascending step crossing probabilities which, driven by the inhomogeneous strain fields around the misfit dislocation clusters, contributes to the growth of periodic ridges.
Keywords/Search Tags:Layers were grown, Surface, Roughening, Growth
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