| The purpose of this research is to explore the potential application of focused ion beam (FIB) technology in microstructure fabrication field. A mathematical model is presented for FIB microstructure fabrication. This model takes advantage of the ion beam sputtering theory, especially the exact sputtering yield computation. The sputtering mechanisms, the sputtering yield computation, and the ion beam and its properties are discussed. The following factors are considered in the mathematical model: ion beam size and distribution, overlap effect, sputtering yield's ion/target and angular dependence. This mathematical model is implemented into an existing FIB system and tested to be successful in ion-milling microstructure objects with 3D-features. |
