Development of a Lead-free Piezoelectric (K,Na)NbO3 Thin Film Deposited on Nickel-based Electrodes

It is desirable to replace noble metals used as electrode materials for piezoelectric thin film with base metals. This will reduce the piezoelectric thin film fabrication cost. A nickel?based layer in conjunction with other protective layers is proposed as a bottom electrode for lead-free piezoelectric KNN thin film. The obtained results do not indicate the oxidation of the nickel?based bottom electrode after the deposition of KNN at 600 °C for 10 hours in the presence of oxygen and/or after annealing the sample at 400 °C for an hour in air. The fabricated KNN thin film was fully characterized in this work. The effective piezoelectric coefficients d33 and d31 were estimated to be 37 pm/V and 17.2 pm/V, respectively, at 100 kV/cm. The piezoelectric properties of the fabricated KNN/Ni/Ti/SiO2/Si are affected by the crystal orientation of the KNN layer, which was preferentially oriented in the (110) direction. Optimization of the deposition parameters of the fabricated KNN/Ni/Ti/SiO2/Si film is expected to further enhance the piezoelectric properties.;Two novel systems utilizing the developed KNN piezoelectric thin film are proposed and their performance simulated based on the achieved KNN thin film parameters. The first is a precision automated nanomanipulation system using an AFM as a sensor and piezo-actuated manipulators. Real-time feedback of the particle being manipulated can be achieved using the proposed system. The length of the manipulators needs to be at least 2 mm to be incorporated with a commercial AFM system. To fabricate the required manipulators, a three-step electrochemical etching technique was developed. Tungsten tips combining well-defined conical shape, a length as large as 2 mm, and sharpness with a radius of curvature of around 20 nm were fabricated using the proposed technique. By depositing the KNN thin film on the fabricated manipulator, nanomanipulators with out-of-plane actuation can be produced. Ultrasonic piezoelectric fan array, the second system, is proposed for GPU cooling applications. The developed KNN thin film is proposed as the piezo layer in the piezo fan structure. The novel solution can offer large air flow rate and low power consumption. Since the operating frequency is beyond the human audible frequencies, non?audible noise fans are expected by using the proposed ultrasonic piezo fan system. Moreover, fabrication of these ultrasonic piezo fans can be part of the GPU fabrication process itself.