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The effects of low pressure nitrogen on titanium cathode sources in titanium nitride arc ion-plating

Posted on:1996-02-27Degree:Ph.DType:Dissertation
University:McGill University (Canada)Candidate:Kim, George Ea-HwanFull Text:PDF
GTID:1461390014985314Subject:Engineering
Abstract/Summary:PDF Full Text Request
The arc ion-plating technique is used in the industrial coating processes where TiN thin films are deposited onto various base materials. The overall objective of this research was to study the effects of low pressure nitrogen introduced into a continuous, titanium vacuum arc. An arc ion-plating system was designed and built to allow for as much flexibility as possible. Permanent magnets were placed behind the cathode surface to confine and rotate the arc.;Changes in cathode, arc and emission properties were noted with respect to vacuum, argon and nitrogen ambients. The introduction of nitrogen, above a critical pressure (...
Keywords/Search Tags:Arc, Nitrogen, Pressure, Titanium, Cathode
PDF Full Text Request
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