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Determination of trace metals in microsamples using a capacitively coupled microwave plasma

Posted on:1997-03-02Degree:Ph.DType:Dissertation
University:University of FloridaCandidate:Pless, Andrea MaraFull Text:PDF
GTID:1461390014981250Subject:Chemistry
Abstract/Summary:
Microwave plasmas, generally operated at 2450 MHz, have become a powerful excitation and atomization source for the determination of trace metals and nonmetals. A capacitively coupled microwave plasma (CMP), is characterized by the propagation of microwaves through a waveguide with the plasma forming at the top of an electrode. This plasma enables thermal vaporization (TV) sample introduction to be accomplished in situ as the plasma forms directly around the sample. Thus, the need for sample preparation, procedural steps, and sample transport is eliminated. This technique is readily employed for discrete sampling without any resultant sample dilution or losses.;This dissertation examines a CMP operating at 450 to 1000 W for the trace detection of metals in solids and solutions by atomic emission spectroscopy (AES). The laboratory-constructed system contains a tungsten cup electrode capable of holding a volume of up to 30...
Keywords/Search Tags:Plasma, Trace, Sample, Metals
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