Modeling and automation of an electron cyclotron resonance source etcher using a chlorine/argon plasma
Posted on:1997-09-25
Degree:Ph.D
Type:Dissertation
University:University of Michigan
Candidate:Hanish, Courtney Kathleen
Full Text:PDF
GTID:1460390014981325
Subject:Systems Science
Abstract/Summary:
As critical dimensions for semiconductor fabrication have continued to shrink, the need for real-time control has increased. This dissertation reports on preliminary work needed to apply real-time control to Cl...