| We proposed a novel approach in designing chemical reactions by attributes like projectiles, momentum transfer, and interaction cross-section that are not familiar to synthetic chemists. Controlled fabrication of cross-linked polymer films were realized by using low energy H+ ions with precise control of ion dose and energy.; Dotriacontane, CH3(CH2)30CH3, was used to investigate the surface cross-linking mechanism induced by H + ions bombardment under a series of ion doses and energies. A three-step surface reaction, including radical generation, radical chain transfer and radical combination processes, was proposed. For tailoring of the surface functionality of polymer films via the new reaction route, docosanoic acid, CH3(CH2)20COOH molecules and poly (acrylic acid) oligomers were selected to fabricate cross-linked polymer films with carboxylic functional groups. After ion beam treatment, ultrathin films with the expected function groups were obtained. The same procedure was used to cross-link self-assembled molecules together with another ultrathin layer of simple organic molecules.; Our research work has included copper and silicon as the substrate. It was found that the formation of cross-linked surface layers with compact structures could protect both silicon and copper substrates not to be oxidized under the ambient condition.; The effect of double bond in a poly (trans-isoprene) film was investigated with H+ ions as radical initiator. Because of the presence of the double bonds, surface cross-linking extended far away from the direct bombarding region. We successfully adhered two silicon wafers together by irradiating the sample at the edge and therefore developed a nanoscale adhering technique.; This novel approach provides the possibility of a wide range of industrial applications. Particularly, the transferring of the process from our delicate low energy ion beam system to an electron cyclotron resonance system will allow large-scale production. |
