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A study on various fabrication routes for preparing multilayered cubic boron nitride films and sp(3)-like boron nitride films

Posted on:2007-08-17Degree:Ph.DType:Dissertation
University:Hong Kong Polytechnic University (People's Republic of China)Candidate:Wong, Sing FaiFull Text:PDF
GTID:1441390005960209Subject:Engineering
Abstract/Summary:
Cubic boron nitride (cBN) has a sp3-bonded structure which leads to excellent mechanical properties. Though cBN-rich films have been successfully fabricated by many techniques, the adhesion of the films is still unsatisfactory due to the high stresses. The maximum sustainable thickness of cBN-rich films with good adhesion is widely reported to be around 200 nm, so many practical applications of cBN coatings are hindered.; In this study, we designed a series of deposition schemes in a logical sequence, in order to explore whether stress can be released, or other structural forms of BN with potential applications can be made, and to gain more fundamental understanding on the growth mechanisms of various phases observed in the films. Various fabrication processes were employed according to the following sequence: (1) A single-step process. It was showed that the maximum tolerable thickness of the cBN-rich films prepared by our system (183nm) was compatible with the result in literatures (200nm). (2) A multilayered deposition process. A thick sp2-bonded boron nitride (sP2-BN) buffer layer which was relatively deformable was added, and hence some stresses were released so as to allow a 643nm-thick, 87vol.% cBN-rich layer with acceptable adhesion to grow on top. (3) An advanced multilayer process with subsequent annealing process. A zirconium layer was pre-deposited to remove the soft buffer layer after postannealing. The interface could be strengthened as the zirconium-boride/nitride was formed. (4) Ion assist deposition at unheated condition. Composite BN films containing sp3 nanoclusters embedded in a sp2-BN matrix were fabricated. The IR technique was not sensitive enough to detect spa nanoclusters, but their presence was verified by the results of other measurements. In particular, the sp3 content can be over 30vo1.%, with a hardness 20GPa. The influences of the assist beam energy and substrate temperature on the generation of the sp3 nanoclusters were investigated in detail. Interestingly, by observing the annealing effects on the structure and mechanical properties of the films, the volume fraction of the sp3 phase dropped with increasing annealing temperature, verifying that some of sp3 nanoclusters were metastable. Two theoretical models were applied to describe the formation mechanisms of these nanoclusters.
Keywords/Search Tags:Films, Boron nitride, Sp3, Layer
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