| In this research, methods for the deposition of patterned films and nanostructures were developed from photochemical metal organic deposition (PMOD).;Electron beam induced metal organic deposition (EMOD) was studied. Feature sizes as small as 12 nm were achieved by negative lithographic EMOD, using Ti(OBun)2(eh)2 and bis(2,2,6,6-tetramethyl-3,5-heptanedionato)(1,5-cyclooctadiene)ruthenium (II), Ru(cod)(tmhd)2. Positive lithographic EMOD was demonstrated for the first time.;Two dry lithographic PMOD (and EMOD) methods were developed. In one method, a film formed from tetrakis(trimethylsiloxy)titanium (IV) was used to produce a latent image by masked UV exposure followed by a thermal treatment, which consists of TixSi1-xO2 in the exposed region but TiO2 in the unexposed region. A negative pattern was obtained by etching the latent image with argon plasma. In the other method, a bis(triphenylphosphine) nickel (0) dicarbonyl film was subjected to masked UV exposure followed by a thermal treatment, resulting in a negative pattern. Ru(cod)(tmhd)2 was also tested with this method and feature sizes as small as 20 nm were obtained.;The lithographic deposition of films with multiple layers was demonstrated. In this method, a film prepared by sequentially spin coating three solutions of complexes, was subjected to a wet lithographic PMOD process, resulting in a negative pattern with three layers. With this method, bi-layer films with different patterns in each layer were obtained too.;Positive lithographic PMOD was demonstrated with films of titanium (IV) di-n-butoxide bis(2-ethylhexanoate) (Ti(OBun)2(eh) 2), titanium (IV) diisopropoxide bis(2,4-pentanedionate), and zirconium (IV) di-n-butoxide bis(2,4-pentanedionate). The photochemistry of these complexes in films was studied by FTIR, AES, and XRD. Photo-induced reactivity and polarity changes are believed to affect film solubility in developers. This made it possible to achieve both negative and positive PMOD by simply altering the developers.;The deposition of patterns with nanostructures was demonstrated using immiscible complexes. In this method, solutions containing immiscible zirconium (IV) 2-ethylhexanoate and yttrium (III) nitrate were used for spin coating. By altering the complexes' ratio and the spinning speed, films with nanostructures of various sizes and densities were obtained. A negative pattern with nanostructures was produced by wet lithographic PMOD from one of the films.;Keywords: Thin film, lithography, metal organic complex, nanostructure... |
