Mask-pattern Transfer Theorety Model And Noval Manufacturing Process Of Holographic Grating

Holographic grating, as the core optical element of the spectrometer, the designand manufacture of technical level directly determines the performance of thespectrometer. Compared with traditional mechanically ruled gratings, holographicgrating with a completely ghost-free line, high signal-to-noise ratio, shortmanufacturing cycle, low-cost type diversity easy grating surface made of a largearea, and many other advantages. Ion beam etching technology development tofurther promote the development of the holographic grating, holographic gratingwith a successful combination of ion beam etching technology, greatly improves theholographic grating diffraction efficiency. However, ion beam etching ions from theion source with photoresist and grating substrate particle collision sputtering processto establish the predictive holographic grating mask ion beam etching patterntransfer theoretical model of holographic grating mask theoretical guidance for theion beam etching process is necessary. Ion beam etching of high aspect ratio gratingmask pattern transfer is one of the problems in the production of holographic grating,due to the urgent needs of the detection of atmospheric CO2, explore new techniqueof ion beam etching pattern transfer is imminent. Wide-band holographic gratingspectroscopic areas has the unique advantages of the instrument structure is simple,easy to use, and how to produce different blaze angle holographic ion beam etched grating is the cutting edge topic of the grating field. The paper focuses on thepattern-transfer theoretical models of holographic grating mask and new technologyresearch. First, based on the analysis of the physical process of the ion beam etchingand the method of characteristic curve, this paper establishs the pattern-transfertheoretical models of holographic grating mask, makes the numerical simulation ofholographic grating mask pattern transfer process and simulates the process offorming grating groove by taking the examples of triangular grating, rectangulargrating, trapezoidal grating, etc. Second, on the basis of pattern-transfer theoreticalmodels of holographic grating mask, the paper gives the design and productionmethods of SiC substrate’s holographic grating which is used in atmospheric CO2detection instrument with visible-near infrared, through the study on methodcombination of the ion beam etching and reactive ion etching, solve the keytechnology for high aspect in the SiC substrate pattern transfer of argon, oxygen,trifluoromethane reaction gas ratio, the ion beam etch rate ratio, the relationshipbetween etch rate and the depth of grating groove, and deal with the roughness of themask and grating groove by physical polishing and chemical polishing technique,reduce to20%of the holographic grating roughness. Third, propose the segmenteddesign method of groove parameters for wide band holographic grating, give thecalculation model for diffraction efficiency of optimized parameters grating, make awide-band blazed grating with the same phase but different blaze angles in differentarea, by using segmented and step-by-step ion beam etching technology, develop200nm~900nm wide-band holographic ion beam etching grating..