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Micro And Nano Structure Photonics Device Design And Theoretical Analysis

Posted on:2008-10-13Degree:DoctorType:Dissertation
Country:ChinaCandidate:G H YuanFull Text:PDF
GTID:1118360212499087Subject:Optics
Abstract/Summary:PDF Full Text Request
The research work within this dissertation is supported by grants from the National Natural Science Foundation of China (No. 10474093, 90206002) and by a grant from the Major State Basic Research Development Program of China (No.2006CB302905). By using rigorous coupled wave analysis (RCWA) and the two dimensional finite difference time domain method (FDTD) simulation software, the physical mechanisms and technological applications of the surface plasmons (SPs) in the subwavelength metallic structures are numerically analyzed, the resonant energy transfer process under near-field optical excitation is theoretically demonstrated.The main research works and conclusions are as following:1. Based on two-dimensional FDTD method, an AFM-assisted SPs leakage mode photolithography technique is proposed and demonstrated, two different excitation methods, the mechanism of local field enhancement, the tolerance of contrast and resolution on the geometrical parameters are systematically investigated. This technique can realize large-area, high-resolution(~15nm), high-contrast(> 75%) and arbitrary-shape pattern fabrication, and has potential applications in ultra-high density data storage and nano pattern photolithography.2. Based on RCWA, the mechanism of transmission enhancement in the dielectric film coated subwavelength metallic grating under s-polarization excitation is investigated in detail. Through the analysis of the transmission spectra and near-field electric distribution, we have confirmed that a waveguide electromagnetic mode supported by dielectric film is mainly responsible for the energy transmission process. This structure shows possible applications in polarization devices (polarization degree is larger than 0.96) and polarization-isotropic devices at infrared spectral range, especially at communication wavelength 1550nm.3. By combining the optical Bloch equations method with the field-susceptibility formalism, we theoretically analyze the resonant energy transfer process between two quantum dots under optical near-fields excitation and derive the density matrix elements and their emitting signal intensity. We also analyze the effect of the complex environments, for example, the tip body of NSOM on resonant energy transfer process and the emitting signal intensity for different polarization incident light. It provides a theoretical method to investigate the resonant energy transfer between quantum dots at the microscale.Highlights of the dissertation are as following:1. An AFM-assisted SPs leakage mode photolithography technique is proposed in an innovative way (easy-integrated metallic grating structure and large-area attenuated total reflection structure). It can realize large-area, high-resolution(~15nm), high-contrast and arbitrary-shape pattern fabrication, and has a good tolerance on geometrical parameters which shows feasibility in realistic industrialization.2. The waveguide electromagnetic mode is used to explain the enhanced optical transmission phenomenon of dielectric film coated subwavelength metallic grating under s-polarization excitation for the first time, the effects of optical properties and energy coupling process on the geometrical parameters are comprehensively described. The possible applications of this structure in polarization device with high polarization degree and polarization-isotropic device at communication wavlength 1550nm is indicated.3. Combining the optical Bloch equations method with the field-susceptibility formalism, the resonant energy transfer process between two quantum dots under optical near-fields excitation is theoretically analyzed on the basis of two energy level model for the first time.
Keywords/Search Tags:Surface plasmons, Photolithography, Enhanced optical transmission phenomena, Quantum dots, Resonant energy transfer
PDF Full Text Request
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