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The Ion Implantation Method Prepare Optical Waveguides And Rf Sputtering

Posted on:2007-05-17Degree:DoctorType:Dissertation
Country:ChinaCandidate:C L JiaFull Text:PDF
GTID:1118360185984246Subject:Condensed matter physics
Abstract/Summary:PDF Full Text Request
Optical integrated devices play an important role in the fields of high-speed long-distance optical telecommunications, broadband optical networks, sensors and smart structures, optical signal processing and optical computing. Waveguide is the base structure of optical integrated devices (circuits). Up to now, many ways have been investigated to fabricated waveguides with excellent performance. Waveguide structures have been formed in many optical materials by ion implantation, a mature method for modifying surface properties of materials.In all the implanted waveguide, MeV H and He ions are most frequently used. The light ion implanted waveguide has been demonstrated to be a typical barrier-confined waveguide. Recently, waveguides fabricated by heavy ion implantation have been extensively investigated. The indices in surface layer have been found to be raised when heavy ions are implanted into some optical materials, such as LiNbO3, Nd:YV04, BBO and KTA etc, then the index-raised layer can be used to define a guiding region. Waveguides formed by heavy ions implantation show an unique advantages: the beam dose can be 1-3 order lower than that of light ion implantation and it can reduce the fabrication cost significantly. Therefore, it is important to investigation on heavy ion-implanted waveguides for the potential application.Zinc oxide (ZnO) is an important II-VI wide band gap semiconductor with WZ crystal structure. Due to their excellent physical and chemical properties, ZnO films have many realized and potential applications such as surface acoustic wave devices, planar optical waveguides, transparent electrodes, ultraviolet photodetectors, piezoelectric devices, gas sensors, UV/violet/blue-LEDs (light emiting diodes) and -LDs (laser diodes), etc. ZnO/MgZnO films were prepared by radio frequency (RF) magnetron sputtering on x-cut and z-cut LiNbO3 substrate, respectively. The structural, optical and guiding properties of the films were investigated.The present work is focused on two aspects: (1) The planar waveguides fabricated on LiNbO3, LiTaO3, SrWO4, BaWO4, Yb:NaGd(WO4)2, KNSBN,...
Keywords/Search Tags:Ion implantation, Waveguide, Propagation loss, Refractive index profile, Radio-frequency magnetron sputtering
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