Research On Micro Structure And Process Of Porous Silicon-Based MEMS Uncooled IR Detectors

This paper based on MEMS uncooled infrared detectors, and detailing uncooled micro-bolometer infrared principle, the key parameters and research development of the device structure and heat-sensitive materials were studied. Proposed uncooled infrared micro-bolometer process based on porous silicon (PS) technology, carried out the process design of the device to study the thermal insulation structure on the impact of device performance, conduct thermal and mechanical analysis; the key issues in MEMS process analysis were discuss, optimization of preparation process and the detector bolometer design of supporting structure to carry out through process improvement.Proposed porous silicon as a micro-bolometer thermal insulation of new ideas, micro-thermal system can get a fast response and low temperature heat loss and improve the system stability and reliability using porous silicon as an insulating layer. In this paper, preparation methods of porous silicon, porosity, thickness, silicon type, and the relationship between microstructure and properties were studied in detailed, and the corresponding computer simulation was conducted; the nano-porous silicon materials, mechanical and thermal testing some of the basic method were introduced; thermal insulation properties of the micro-structure and its relationships of porous silicon insulation materials using of micro-Raman spectroscopy was studied; the hardness and Young's modulus of porous silicon and microscopic structure was measure using nano-indentation instrument to obtained mechanical properties.Using DC reactive target magnetron sputtering of vanadium oxide thin films (VOx), studied the substrate conditions on the microstructure of vanadium oxide thin films, nano-mechanical properties and resistance-temperature properties; VOx / PS / Si structures were prepared, impacted of porous silicon surface micro-structure on the micro-structure of VOx film growth process was tested, and VOx / PS / Si thin-film structures of nano-mechanical property and resistance temperature properties testing were carried out.ANSYS structural design and IntelliSuite software process simulation for the uncooled infrared micro-bolometer structure were carried out. Uncooled infrared micro-bolometer structure design theoretical analysis and actual modeling analysis were carried out in experiment. At the same time the micro-bolometer process, layout design and verification processes were carried out and the corresponding process optimization program was proposed. MEMS micro-fabrication technologies was used to achieve the micro-bridge structure formation and to meet the manufacture of uncooled array detection system's need for the development of infrared imaging technology.