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Keyword [chemically amplified]
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1. The Chemically Amplified Resist Composition And Its Lithography For Electronic Beam
2. Krf Excimer Chemically Amplified Photoresist In 90nm Logic Processes On The Performance Evaluation And Optimization Of Process Conditions
3. Exploration of non-chemically amplified resists based on chain-scission mechanism for 193 nm lithography
4. Issues in deep-UV photoresist technology: Characterization and modeling of bulk and surface imaged resists for 248 and 213 nm lithography
5. Photoresist Exposure And Development Effect And Its Application In Computational Lithography
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