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Keyword [atomic layer deposition]
Result: 81 - 100 | Page: 5 of 6
81. Study On Al2O3 Nano-barrier Coating By RF-DBD Atmospheric Pressure Plasma Assisted ALD And Pulse CVD
82. Studies Of Flash Memories Based On O3-Al2O3 Prepared By Atomic Layer Deposition
83. Low Temperature Growth Of Polycrystalline InN Films On Non-crystalline Substrates By Atomic Layer Deposition And Fabrication Of Thin Film Transistor
84. Study On Simulation Model Of Atomic Layer Deposition In Advanced Technology Nodes
85. Study On Fabrication And Stability Of ZnO-based Thin-film Transistors Via Atomic Layer Deposition Technique
86. Study On Atomic Layer Deposition Of Alumina Film And Application Of Reflection High Energy Electronic Diffraction In Growth
87. Atomic layer deposition enabled interconnect and packaging technologies for as-grown nanowire devices
88. Plasma-enhanced atomic layer deposition zinc oixde flexible thin film electronics
89. Atomic Layer Deposition of Platinum Nano-particles and High-k Dielectrics for Non-volatile Charge Storage Memory Devices
90. Atomic layer deposition of lanthanum based oxides for high-K gate dielectric applications
91. Metal-gate/high-k dielectric stack engineering by atomic layer deposition: Materials issues and electrical properties
92. Modification of semi-metal oxide and metal oxide powders by atomic layer deposition of thin films
93. Plasma enhanced atomic layer deposition ZnO thin film transistors for large area circuit applications
94. Reactions of high-k gate dielectrics: Studies in hafnium, zirconium, yttrium, and lanthanum-based dielectrics and in-situ infrared results for hafnium dioxide atomic layer deposition
95. Nano-scale zirconia and hafnia dielectrics grown by atomic layer deposition: Crystallinity, interface structures and electrical properties
96. High-power and high-aspect-ratio optical coatings by atomic layer deposition
97. Processing and characterization of high performance gate dielectric materials by rapid photothermal process based atomic layer deposition (ALD) system
98. Atomic layer deposition and properties of refractory transition metal-based copper-diffusion barriers for ULSI interconnect
99. Surface Chemistry and Interface Evolution during the Atomic Layer Deposition of High-k Metal Oxides on InAs(100) and GaAs(100) Surfaces
100. Preparation And Characterization Of LED Heterojunction Devices Based On Atomic Layer Deposited ZnO
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