Keyword [Soft breakdown] Result: 1 - 2 | Page: 1 of 1 1.  Gate Leakage And Soft Breakdown Properties Of Small-Scaled MOS Device 2.  Interface engineering and reliability characteristics of hafnium dioxide with poly silicon gate and dual metal (ruthenium-tantalum alloy, ruthenium) gate electrode for beyond 65 nm technology   <<First  <Prev  Next>  Last>>  Jump to

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